近日，广州市积极推动半导体产业链关键环节的本土化布局，重点集聚发展光掩膜（Photomask）等核心制造材料生产线。光掩膜是芯片制造中不可或缺的关键材料，用于在光刻工艺中将电路图案精确转移到硅片上，其精度和质量直接影响芯片性能。随着全球半导体供应链重构加速，广州依托粤港澳大湾区的产业基础、科研资源与政策支持，吸引多家国内外领先企业布局光掩膜及相关材料产线。此举不仅有助于提升我国在高端半导体材料领域的自主可控能力，也将强化广州作为国家集成电路产业重要节点城市的竞争力。未来，广州计划通过建设专业产业园区、加强产学研协同、优化营商环境等举措，进一步完善从材料、设备到设计、制造的全产业链生态，为我国半导体产业高质量发展提供坚实支撑。
Recently, Guangzhou has actively promoted the localization of key segments in the semiconductor industry chain, with a particular focus on clustering the production lines of core manufacturing materials such as photomasks. Photomasks are essential components in chip manufacturing, used in photolithography to precisely transfer circuit patterns onto silicon wafers—their accuracy and quality directly impact chip performance. As global semiconductor supply chains undergo rapid restructuring, Guangzhou leverages the industrial foundation, research resources, and policy support of the Greater Bay Area to attract leading domestic and international companies to establish photomask and related material production facilities. This strategic move not only enhances China’s self-reliance in high-end semiconductor materials but also strengthens Guangzhou’s position as a pivotal node in the national integrated circuit industry. Moving forward, Guangzhou plans to further develop a comprehensive industrial ecosystem—from materials and equipment to design and manufacturing—by building specialized industrial parks, fostering industry-academia-research collaboration, and optimizing its business environment, thereby providing robust support for the high-quality development of China’s semiconductor sector.
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